Oxides Research Group

Research in our group is primarily focused on oxide thin films and nanostructures with emphasis on understanding how processing affects properties. Research activities include developing mechanistic understanding of initial stages of oxidation of metals and oxygen incorporation into oxides under photon irradiation. Phase evolution in oxides and their stability as a function of temperature and doping is investigated using combination of structural, electrical and electrochemical studies. Quantitative determination of oxygen concentration in nanoscale oxides and research on techniques to precisely control oxygen stoichiometry at interfaces are also being actively pursued. Potential applications of our research include electronic devices, solar and hydrogen energy conversion, sensors.

Some on-going projects include:

      Mechanistic understanding of role of electric fields in initial oxidation kinetics of metals and alloys

      Size effects on ion conduction mechanisms in fluorite oxides

      Phase transition mechanisms in rutile oxides and their active tuning

      Precise measurements of oxygen concentration and migration kinetics at oxide hetero-interfaces

Current members

Oxides group publications

Current Members

2011 Oxides Research Group
Rowland Institute at Harvard Harvard University
100 Edwin H. Land Blvd.
Cambridge, MA 02142 Fax: 617-497-4627

Shriram Ramanathan
Associate Professor

 

LaShanda Banks
Admin Assistant

 

           
Viswanath Balakrishnan
Post Doctoral Fellow
  Sieu Ha
Post Doctoral Fellow
 
           
Byoungseon Jeon
Post Doctoral Fellow
  Quentin Van Overmeere
Post Doctoral Fellow
 
           
Robert Schafranek
Post Doctoral Fellow
  Frank Schoofs
Post Doctoral Fellow
 
           
Jian Shi
Post Doctoral Fellow
  Franklin Wong
Post Doctoral Fellow
 
           
Suhare Adam
Graduate Student
  Kian Kerman 
Graduate Studen
 
           
Jai Sim
Graduate Student
  You Zhou
Graduate Student
 
           
Siyabulela Xuza
Undergraduate Student